Back to Eliza

Eliza E1 v0 thermal stack

packages/chip/docs/board/thermal-stack.md

2.0.33.9 KB
Original Source

Eliza E1 v0 thermal stack

Date: 2026-05-19 Status: planning. No board exists. No silicon power is measured. Claim boundary: Planning document. Promotion requires fabricated boards with TIM applied, IR thermal-camera captures at sustained workloads, and correlated thermistor readings under the IEC 60950-1 / IEC 62368-1 skin temperature limit (≤ 43-45 °C).

v0 thermal envelope assumptions

BlockBurst (W)Sustained (W)Source
AP cluster2.51.4docs/architecture-optimization/soc-optimized-operating-point.yaml#cpu_active_w_max
NPU3.01.2same npu_active_w_max
LPDDR PHY+DDR0.80.5LPDDR5X 6.4 Gb/s burst budget
Display+DSI0.40.4720x1280 backlight + DSI driver
Wi-Fi/BT1.20.3Murata Type 1DX TX peak
Misc PMIC/0.50.2regulator + audio + sensors quiescent
audio
Total8.44.0

Peak budget aligns with research/process_packaging_2026/02_analysis/thermal_reliability_2nm.md: vapor-chamber transient phase absorbs 4-8 W; post-saturation steady-state holds 4-6 W. v0 must clear the steady-state envelope with no vapor chamber.

v0 thermal stack (no vapor chamber)

Stack from die outward:

SoC die (face-down BGA)
  └─► Package lid (no IHS in v0; bare die)
        └─► TIM 1: Honeywell PTM7950 (phase-change TIM, 1.5 mm² @ 8 W/mK)
              └─► Graphite spreader: 100 mm x 60 mm x 75 µm artificial graphite
                    └─► Gap filler 2 mm thick (e.g. Bergquist Gap Pad TGP 5000)
                          └─► Back cover (3 mm aluminium + plastic shell)
                                └─► Ambient

v1 upgrade path (vapor chamber)

If v0 measured silicon power exceeds 4 W sustained at 43 °C skin, upgrade to a v1 thermal stack:

SoC die
  └─► TIM 1: PTM7950
        └─► Vapor chamber: 80 mm x 50 mm x 0.5 mm (e.g. CCI vapor chamber)
              └─► Graphite spreader 100 mm x 60 mm x 75 µm
                    └─► Gap filler 1 mm
                          └─► Back cover
                                └─► Ambient

Vapor chamber adds ~ 1.5 °C/W of thermal resistance reduction at the die junction at the cost of 0.5 mm thickness and a per-unit BOM increase in the $2-5 range.

Skin temperature plan

  • Two NTC thermistors on the mainboard near hot blocks (AP and NPU) for closed-loop AOSP Thermal HAL throttling.
  • One NTC on the inside of the back cover for skin-temp limit enforcement.
  • AOSP Thermal HAL v2.0 cooling devices defined per package/pmic/da9063.yaml rail mapping; cpufreq + npufreq throttle to meet ≤ 43 °C skin in worst case.

Validation gates (all currently fail-closed)

  • IR thermal camera capture at 30-min sustained CPU+NPU 100% workload.
  • Two-point thermistor logging at 1 Hz during the same workload.
  • Skin-temperature compliance per IEC 60950-1 / IEC 62368-1.
  • AOSP Thermal HAL throttling transcript showing the throttle policy fires before skin temp violations.

Cross-references

  • docs/architecture-optimization/physical-power-thermal.md
  • docs/architecture-optimization/soc-optimized-operating-point.yaml
  • docs/spec-db/process-14a-effects.yaml
  • research/process_packaging_2026/02_analysis/thermal_reliability_2nm.md
  • research/mobile_platform_2026/02_analysis/sensors_audio_thermal.md